The system of gases control is efficiently used for solving the following tasks: maintenance of preset consumption or pressure in the chamber, maintenance of films stoichiometry during reactive sputtering (by optical plasma emission, voltage, charge current), maintenance of film thickness uniformity when sputtering with extended magnetron, ion-beam devices. The system can operate both in stand-alone mode, and as part of automated control system (ACS). Communication is made through interface RS232 under protocol MODBUS. Gases control system includes control unit for vibration leaks FC-3 and vibration leaks proper. The system can be additionally completed with plasma emission sensor for maintaining preset films stoichiometry by way of adjusting mixture of gases during reactive magnetron sputtering. All elements can be supplied to customers as stand-alone units, or as a system.