Purpose:

Sensor is designed for converting intensity of plasma glow at certain wave length into standard electrical signal.

Application:

Control of magnetron plasma spectrum, ion-beam sources in vacuum for maintaining stoichiometry of sputtered film.

Merits :

• High sensitivity;
• Small dimensions;
• Possibility of operating inside vacuum chamber.

Versions of sensor design depending on assembly method:

• Measurement of optical plasma emission via fiber-optical cable;
• Inter -vacuum measurement of plasma optical emission. Sensor is mounted in direct plasma visibility zone inside the vacuum chamber;
• Inter-vacuum measurement of optical plasma emission . sensor is mounted in direct plasma visibility zone via optical inlet.