The system of ion-beam cleaning IBCS is designed for finish cleaning of substrate surface off molecular particles, adsorbed gases, polymer fragments, water, and also for activation of substrate surface bonds just before coating deposition. Ion-beam cleaning guarantees excellent adhesion between the first deposited layer and substrate. Ion-beam source can be supplied complete with original power unit IPS-C-5K.

Purpose:

Technology of ion-beam cleaning IBCS is designed for finish cleaning substrate surface off molecular particles, adsorbed gases, polymer fragments, water vapors, as well as for activation of substrate surface bonds in the vacuum chamber just before thin-film coating deposition. The use of ion-beam cleaning technology guarantees much higher degree of adhesion as against traditional methods (for instance, glowing charge or plasma cleaning), which finally results in longer and more reliable operation of coated parts.

Dimensions of ion cleaning sources can vary from 140 mm to 3500 mm. Mounting of ion cleaning sources present no difficulty in practically all types of vacuum assemblies of flow or periodic type.

To make operation of ion sources reliable and efficient, IZOVAC has developed power supply units of series IPS-I and series IPS-C2 power units for thermal compensators.

Fields of application:

• Ion-beam cleaning of optical parts before sputtering (lenses, input windows, etc.)
• Ion cleaning of flexible substrates (PET, PEN,and so on) before coating deposition on rolls in “web coating” technology – packing industry, solar batteries, modern displays.