IZOVAC presents ids newest development – Ion assisting source “Strelok."

Ion source “Strelok” of Hall type has been developed for forming high-intensity low-energy ions flows in vacuum. It is equipped with thermal compensator with reserve filament to neutralize volumetric beam charge. Ion source body and anode are water cooled, and source of magnetic field is solenoid. The Source is mounted inside the chamber or on the flange. Control is manual or automatic from power supply unit IZOVAC of series IPS-A.

Purpose and application

It is designed for ion cleaning of substrates and assisting film coatings deposition using vacuum evaporation and sputtering methods. Fields of application: UV, visible and IR optics, laser equipment, microelectronics, decorative and protection coatings.

Design features:

• Degree of sputtering of ion source elements is considerable reduced as compared to foreign-made analogues.
• Dynamic range of operation pressures is extended owing to introduction of new technical innovations.

You can get more detailed information, if you download our brochure or make request for assisting source.