“Izovac” Company presents a new equipment generation. Linear vacuum units of the passage type.

Main applications:

•  display production
•  application of a metal coating
•  application of oxides and nitrides
•  optical coatings

Main features

•  Linear system with vertical deposition arrangement
•  Deposition area by generation G4800х1000 mm
•  One- or double-sided application of films in one transmission (depending on system configuration)
•  Loading-unloading of substrates in one point of a clean room, no necessity of a return conveyer
•  Organization of cryogen and turbo-molecular pumping out for reduction of the servicing time and duration of system launching.
•  The transportation system is organized on the chamber bottom with absence of friction parts in the deposition area by making it possible to organize deposition without defects due to low generation of particles.
•  Reactive application with double magnetrons or DC magnetron deposition.
•  Organization of symmetrical pumping out of the deposition area for guaranteed uniformity of deposition
•  Organization of carriages motion without any clearance in the deposition area for effective use of deposited targets
•  Reactive deposition control system for high speed deposition
•  IR heating of substrates
•  Cycle period – from 45 seconds depending on the technological process.

In-line equipment for decorative color coating

Application:

Vertical-type technological line is intended for deposition of color decorative coatings on flat substrates with maximum dimensions 800 x 470 mm by magnetron sputtering.

Main features:

• transport system in the bottom chamber section – no moving/contact parts above the substrate for particle-free deposition,
• DC magnetron systems for metals/AC magnetron systems for oxide/nitride deposition,
• gas separation between sputtering zones to exclude cross-contamination,
• symmetrical sputter zone pumping for stable uniformity,
• continues train carrier movement for effective material deposition,
• color uniformity control,
• ion beam substrate cleaning before deposition,
• two stage load lock system,
• minimal tact time 50s (coating dependant),
• PC-based HMI with subordinate PLC control.