Ion-beam cleaning technology is intended for finish cleaning of substrate surface with accelerated ions beam with energy up to 1500 eV from molecular particles, adsorbed gases, polymer fragments, water vapors, as well as atomic activation of substrate surface bonds just before thin-film coating deposition. The use of ion-beam cleaning technology provides much higher degree of adhesion as against traditional methods (glow discharge or plasma cleaning), which finally results in more prolonged and reliable operation of coated parts.

IZOVAC specialists have developed sources of series IBCS having various ion-beam configurations, allowing to perform ion-beam cleaning of any articles, including large sized. The merits of this technology are high degree of uniformity of articles being processed, possibility to carry out cleaning at different angles of any substrates (metals, semiconductors, polymers), high cleaning precision.