Atis 500 V

 

Main specifications

Load / capacity

Up to 65 substrates (size 60*48 mm), manual load

Pumping system

Dry pump for low vacuum, turbo molecular or cryogenic pump for high vacuum.

Ultimate pressure in clean dry chamber, Pa

5х10-4

Monitoring system

By quartz (thickness), resistance or time

Technological devices

Magnetron sputtering system, Ion Beam Cleaning system

Substrate heating

Up to 400 °С

Uniformity

±2.5%

Utilities

Water

Distilled

CDA

6…8 kg/cm2

Power

380/220 V±10%, 50 Hz

Gases

Ar  99,99%, 0.2 l/min

O2  99,7%, 0.2 l/min

Installation area, mm

2900 × 2300 × 2400

Weight, kg

1700

 

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