Elato

  • Ideal for Au, Ag, Pt film deposition
  • Clean Room ready
  • Load-Lock system (optional)

Main specifications

Chamber diameter

350 mm

Pumping system

Dry pump for low vacuum, turbo molecular or cryogenic pump for high vacuum.

Ultimate pressure in clean dry chamber, Pa

6,7 х10-5

Monitoring system

Quartz monitor

Optical monitor (optional)

Substrate holder

Planetary type 

Heating

IR lamps, Resistive heater

Technological devices

Electron beam evaporator, Thermal evaporator, Magnetron, Ion beam source

Uniformity

±5% - Ø100 mm.

Utilities

Water

Distilled

CDA

6…8 kg/cm2

Power

380/220 V±10%, 50 Hz

Gases

Ar  99,99%, 0.2 l/min

O2  99,7%, 0.2 l/min

Installation area, mm

3800х3400х2000

Weight, kg

1500

 

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