AOC vacuum system is intended for the deposition of complex optical coatings by the method of magnetron sputtering of materials with oxidation by RF plasma source.
RF plasma source as well intended for cleaning and activation of the substrates surfaces before deposition process. The technological method represents the deposition of thin layers of metals (1-3 nm) or semiconducting materials with the following oxidation of the layer in the ionized gases environment. The method allows to receive high quality dielectric coatings with the high deposition rate. Vacuum system configuration allows to deposit two different materials in one technological process with controllable deposition rate for each material.
Substrate holder of drum type, load-lock vacuum chamber, single wave or broadband monitoring system allows to reach high productivity of the system with the high yield.
- High deposition rate
- Load-lock vacuum chamber
- Substrate holder of drum type with the set of faces of different sizes
- Single wave or broadband optical monitoring system
- Deposition of two different materials in one technological process with controllable deposition rate for each material
TECHNOLOGICAL DEVICES :
- RF plasma source
- Two DC-magnetrons