IZOLAB vacuum system is intended for a small-scale production of thin-film coatings as well as for R&D tasks.
The deposition is carried out by method of magnetron sputtering with preliminary ion-beam cleaning. The
coatings are deposited on substrates installed on a substrate holder of the disk type

- Ion-beam cleaning source
- DC-magnetron
- Pulse-DC magnetron
- RF- magnetron

Maximum substrate diametr 200 mm
Maximum coating thickness uniformity ± 3,0%
Ultimate residual pressure in the clean technological vacuum chamber 5×10-4 Pa
Coatings control Quartz system for thickness control
Control by time