Enlarged version of compact ORTUS 700 that is aimed to provide possibility to work with bigger substrates
For coatings examples and deatil information about ORTUS please download the ORTUS CATALOGUE.
Configuration options.
1. Substrate holder
| size | loading cap. of 1" for reff. |
Thickness U% for all loading area | Max single substrate size | |
| Dome type | ø800 mm | 356 | ±2% | 300 mm |
| Planetary | 4 x ø327 mm | 284 | ±1% | 327 mm |
2. Technological devices
- Electron Beam Evaporation (EBE)
3 different sizes EV M-6, EV M-8, EV M-10
Customized crucibles, 1 ... 12 pockets
Max. quantity : 2 pcs
- Cleaning and Assistance sources
Strelok-3 : End-Hall ion source with Ion Current Dencity up to 1 mA/cm^2
Luch: Accelerator with anode Layer (Ion Current Dencity up to 4.2 mA/cm^2)
Copra: RF ion source (Ion Current Dencity up to 2.5 mA/cm^2)
Max. quantity : 1 pcs
-Resistance evaporation source
Max. quantity : 1 pcs together with 2 EBE
3. Coating process control
- Rate and thickness control system (quartz control)
- Optical process control system IZOVAC OCP
OCP Broad Band for spectral control
OCP Single Wave for monochromatic control
4. Accessories
Substrate heating system
- IR lamps
- Tubular heater