ORTUS-900

Enlarged version of compact ORTUS 700 that is aimed to provide possibility to work with bigger substrates

For coatings examples and deatil information about ORTUS please download the ORTUS CATALOGUE.

Configuration options.

1. Substrate holder

  size loading cap. of 1"
for reff.
Thickness U% for all loading area Max single substrate size
Dome type ø800 mm 356 ±2% 300 mm
Planetary 4 x ø327 mm 284 ±1% 327 mm

2. Technological devices

     - Electron Beam Evaporation (EBE)
          3 different sizes EV M-6, EV M-8, EV M-10
          Customized crucibles, 1 ... 12 pockets
          Max. quantity : 2 pcs

     - Cleaning and Assistance sources
          Strelok-3 : End-Hall ion source with Ion Current Dencity up to 1 mA/cm^2
          Luch: Accelerator with anode Layer (Ion Current Dencity up to 4.2 mA/cm^2)
          Copra: RF ion source (Ion Current Dencity up to 2.5 mA/cm^2)
          Max. quantity : 1 pcs

     -Resistance evaporation source
          Max. quantity : 1 pcs together with 2 EBE

3. Coating process control

     - Rate and thickness control system (quartz control)

     - Optical process control system IZOVAC OCP
          OCP Broad Band for spectral control
          OCP Single Wave for monochromatic control

4. Accessories

     Substrate heating system
          - IR lamps
          - Tubular heater

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