Mira 540

Main features:

  • Parallel plates RF plasma reactor for high homogeneity
  • Innovative double side reactor for simultaneous passivation of front & back sides
  • No cross contamination
  •  No wafer flipping
  • Minimal contact of wafer surface with transport system elements
  • No surface damage
  • High quality passivation

Technical data

Throughput       540 substrates/hour

Substrate          wafer 6 (other sizes  possible)

Coating area     (3x3) 6 wafers, 488x488 mm

L/UL                   fully automated (optional)

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