Ion Beam Sputtering (IBS) or Ion Beam Deposition (IBD) is a kind of Phisical Vapor Deposition (PVD) technology that use ion source to bombard target for physically removing material from the target which is deposited on the substrate surface. The main advantage of IBS is a possibility to deposit very dense and high quality thin films with extremely high thickness precision and stability compare to other PVD technologies.
The latest development of IBS is combination of grided RF ion source for sputtering with RF ion/plasma source for assistance that called Double Ion Beam Sputtering (DIBS). It enhance classical advantages of IBS with independant control of film growing process (microstructure, stoichiometery and stress) and substrate preclean.
The lowest total optical losses, exceptional environmental stability and durability, very high purity, the highest stability of deposition rate and optical contstants make IBS/DIBS a greate choice for the most challenging high-end applications as biomedical, high power lasers, telecom, aerospace and airplanes industries.
Additional levels of control can be achieved with integration of optical monitoring to observe the optical deposition process and adjust the process parameters in real-time .
Advantages of films coated by IBS/DIBS:
- high dencity (near bulk-like material)
- low absorption
- low scatering (low roughness)
- high uniformity
- stable optical constants and deposition rate
- excelent purity
- excelent adhesion
Compare to other PVD methodes IBS/DIBS has lower troughput and higher cost that is fully covered by exeptional film performance which cannot be reached by others.
IZOVAC history started from IBS technology when company founders started R&D in cooperation with Nobel Laureate J. Alferov in 1970's having made a scientific basement for future realization in industrial coating equipment.
Having made a lot of researches and many kinds of Ion Sources during 1970-1990 Izovac team had the reach experience to start IBS vacuum coaters manufacturing in 1998 based on DC Ion Sources (accelarator with anode layer).
At present tens of years of experience in IBS are realized in LIDIZ family - product that combine RF grided sputtering ion source with RF neutralizer, RF ion/plasma assistance source and fully automated optical monitoring system OCP Broad Band/Single Wave for exceptional precision and reliability.
|IBS/DIBS coaters from 700 to 1100 mm chamber size with RF grided ion source, RF assistance, planetary or single disk substrate holder, optical monitor IZOVAC OCP|